I do, we have them as a client.This is revolutionary. The reason 5 nm took so long is because traditional 193 nm ArFi DUV lithography (the process by which light is used to pattern wafers using photoresist) needed multiple patterning to achieve 10 nm. Now that EUV, which has been in development by ASML for over 25 years is finally ready, we can finally scale down to sub 7 nm, without the need for multiple patterning. Even more exciting is when ASML will release their high-NA EUV tools next year, we'll be seeing bigger jumps and node shrinks.
ASML is one of the most important companies on planet earth now, and few even know it exists.
We hear a lot of bragging here on MR for stuff made in the USA, guess what, they'd be nowhere without foreign tech (and foreigners) including ASML/Arm/Samung amongst many..MANY others.