ksz said:Huh? A new process? Where are you getting this?
I'm getting this from here...
-from the original post
IBM and Toppan Printing Co Ltd announced a $200 million deal to jointly develop a 45-nanometer chip making process aimed at production by mid-2007.
Specifically, the companies hope to develop a photomask process, which would be used to etch patterns of integrated circuits onto silicon wafers, to enable early production of advanced 45nm semiconductors.
ksz said:Are you suggesting that IBM developed a process for 65nm, tried to make it work, decided to give up, and are now focusing that process on 45nm feature sizes? If something could not work on 65nm, why would it work on 45nm?
I should have been more clear.
I'm seeing a lot of posts along the lines of 'If IBM can't get 90 nm to work then why are they going to a 45nm process.'
This is what I was addressing when I said that the jump from 90nm to 45nm is irrelevent.
I don't think that IBM would skip 65nm development but hey if they've got a better process, I'm not going to complain if they go directly to 45nm.
ksv said:Well of course, so would everyone else. That's my point. IBM could just as easily announce that they are working on the 30nm process, which actually they probably are, but so what? Once the new process is stable and ready for daylight, they will move whatever designs onto that process that are justified by the economics of the process and the design. This is simply common sense.
If 45nm requires entirely new (or substantially new and different) design rules, it will require an expensive re-synthesis of the chip design. The general trend is towards fewer new design starts at smaller technology nodes because reusable cell libraries are liberally employed in today's designs. Designers do not create new devices entirely from scratch. Instead, like reusable software components, they assemble new designs by reusing preexisting cell libraries and developing any necessary new logic. If the reused cell libraries are too far removed from the design-rule requirements of the current process technology, the old design may need to be discarded in favor of a grounds-up redesign or re-synthesis. This becomes very expensive.
Hence, the economoics of the device (its lifetime, expected production volume, and selling price) may justify a redesign or it may not. If the expense of a redesign cannot be justified, the part will continue to be produced on N or N-1 technology nodes. Eventually and gradually cell libraries will migrate to new design rules and the vendors who make and sell these libraries (and the internal design departments that do the same) will update their libraries to fit the DFM (design for manufacturing) requirements of the latest process.
Your original post stated that 'It (the article) does not say anything about a new PowerPC chip on 45nm, only that IBM -- like everyone else -- is working actively on 45nm process develoment." I figured that you didn't think that IBM was developing this process for PPC (I shouldn't have assumed). Of course it seems logical that they would make a PPC on 45nm.
Not everyone in here is as well versed in chip manufacturing processes as you, I was just trying to make it clear to those that are still complaining that IBM can't get 90nm straight that this is not the same as making a 90nm chip. IBM, along with everyone else, is trying to find new ways to make smaller and faster processors and they've found a new way. This is a good thing for everyone, hopefully even Mac users.